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高纯度大宗化学品
高纯度大宗化学品
| 品名 | 叙述 | 詢價 |
|---|---|---|
| 醋酸 (CH3COOH) | 用于光刻和清洁过程中，去除有机残留物并改善光刻胶的附着力。 | |
| Hydrogen Peroxide (H2O2) | ||
| Nitric Acid (HNO3) | ||
| Phosphoric Acid (H3PO4) | ||
| Sulfuric Acid (H2SO4) | ||
| Ammonium Hydroxide (NH4OH) | ||
| Potassium Hydroxide solution (KOH) | ||
| Sodium Hydroxide solution (NaOH) | ||
| Tetramethylammonium Hydroxide solution (TMAH) | ||
| Acetone | ||
| n-Butyl Acetate (NBA) | ||
| Isopropanol (IPA) |